logo
Wuhan Fengfan International Trade Co.,Ltd. 86-27-85615818 info@fengfan.net
EN 6786 High Phosphorus Electroless Nickel Plating with Fast Deposition Rate Non-Magnetic Semi-Bright to Bright Coatings

EN 6786 High Phosphorus Electroless Nickel Plating with Fast Deposition Rate Non-Magnetic Semi-Bright to Bright Coatings

  • Làm nổi bật

    Fast Deposition Rate Electroless Nickel Plating

    ,

    Non-Magnetic High Phosphorus Nickel Plating

    ,

    Semi-Bright to Bright Coatings EN 6786

  • Sử dụng
    Niken hóa học
  • Kiểu
    Mạ niken điện phân có hàm lượng phốt pho cao
  • Hàm lượng phốt pho
    10 - 14% ((wt)
  • Nguồn gốc
    Trung Quốc
  • Hàng hiệu
    FENGFAN
  • Số mô hình
    EN 6786
  • Số lượng đặt hàng tối thiểu
    Có thể thương lượng
  • Giá bán
    Có thể đàm phán
  • chi tiết đóng gói
    Bao bì xuất khẩu tiêu chuẩn
  • Thời gian giao hàng
    15-25 ngày làm việc
  • Điều khoản thanh toán
    L/C, D/A, D/P, T/T, Liên minh phương Tây, Moneygram
  • Khả năng cung cấp
    200000pcs/ngày

EN 6786 High Phosphorus Electroless Nickel Plating with Fast Deposition Rate Non-Magnetic Semi-Bright to Bright Coatings

EN 6786 High Phosphorus Electroless Nickel Plating
EN 6786 High-phosphorus Electroless Nickel Plating is a new type of electroless nickel-phosphorus alloy plating process. This process exhibits excellent stability with a high phosphorus content ranging from 10 to 14 (wt.%), and a maximum deposition rate of 10-18 micrometers per hour. EN 6786 provides semi-bright to bright coatings with outstanding corrosion resistance that meets MIL.SPEC.26074D and AMS.2404B standards.
I. Coating Characteristics
  • Magnetism: Non-magnetic
  • Phosphorus content (wt%): 10 - 14
  • Coating density (g/cm³): 7.1 - 7.9
  • Melting point (°C): 860 - 950
  • Electrical resistivity (μΩ•cm): 40 - 100
  • Hardness (HV): 500 - 600
  • Hardness after heat treatment (HV, 400°C for 1 hour): 900 - 1000
  • Neutral salt spray test (ASTM B117): Above 1000 hours at 35°C, 5% NaCl
  • Nitric acid test (68% concentrated nitric acid, room temperature): No color change after 1 minute or more
II. Process Characteristics
  • Fast deposition rate: 10-18 μm/h
  • High phosphorus content, non-magnetic coating with excellent corrosion resistance and ductility
  • Excellent stability with a lifespan of over 8 cycles
  • Low coating porosity, no porosity up to 15 μm, strong corrosion resistance
  • Wide range of bath loading: 0.2-2 dm²/L
III. Preparation of Plating Solution
Composition and operating conditions Process Parameters
EN 6786 A 60 ml
EN 6786 B 180 ml
pH 4.2 - 5.0, adjusting pH with ammonia water
Temperature 85 - 90 ℃
Working load capacity 0.2-2 dm²/L
Agitation or stirring Air agitation for filtration